Carbon nanotubes CNTs are among the important materials for the advancement of future nanoscience and nano-technology. Recently, vertically aligned multiwalled carbon nanotubes VA-MWCNTs have gained additional attention for innovative applications, such as nanotubes antennas,1vertical transistors,2,3 and vertical biosensors.4 Ideally, these applications require VA-MWCNTs to be grown at desired patterns. Plasma-enhanced chemical vapor deposition PECVD is the only technique for growing individual VA-MWCNTs at desired locations. However, the graphitic order of these VA-MWCNTs is inferior to the multiwall CNTs grown by arc discharge5 and thermal chemical vapordeposition.6–8 This has been a long-standing issue for realis-tic uses of VA-MWCNTs in applications, such as electron field emission devices.9–13